|
Dependence of Thin-Gate Oxide Properties on Processing Pages: 13 Published: Jan 1983
Download this paper for $25
PDF (184K)
View License Agreement Thin-gate oxides (23 nm or less) will be very important for future very-large-scale-integration (VLSI) circuits. Oxides in this thickness range can be grown in different environments and temperatures. Breakdown, interface properties, and electron and hole trapping are affected by the growth conditions. The effect of growth and anneal temperature on insulator and interface properties will be examined. Such information is useful in optimizing process conditions for the long-term reliability of thin-gate oxides. | ||