STP804

    Hydrogen/Chlorine Distributions in Silicon Dioxide: Detection and Model

    Published: Jan 1983


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    Abstract

    Secondary ion mass spectrometry (SIMS) and electron microscopy have been used to investigate the distribution of hydrogen and chlorine in SiO2 films thermally grown on silicon. These films have been grown in various ambients, including pure O2, steam, HCl/O2, and Cl2/O2, as well as HCl/O2 mixtures diluted with N2. The data suggest that there exists a strong interaction between the chlorine and the hydrogen, with the chlorine being a very effective gettering agent for hydrogen. The results of this investigation, as well as a model explaining the incorporation and distribution of the hydrogen and chlorine, are presented.

    Keywords:

    silicon dioxide, modeling, hydrogen/chlorine distributions, SIMS, electron microscopy


    Author Information:

    Monkowski, JR
    Pennsylvania State University, University Park, Pa.

    Monkowski, MD
    Pennsylvania State University, University Park, Pa.

    Tsong, IST
    Arizona State University, Tempe, Ariz.

    Stach, J
    Pennsylvania State University, University Park, Pa.


    Paper ID: STP36172S

    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP36172S


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