SYMPOSIA PAPER Published: 01 January 1983
STP36172S

Hydrogen/Chlorine Distributions in Silicon Dioxide: Detection and Model

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Secondary ion mass spectrometry (SIMS) and electron microscopy have been used to investigate the distribution of hydrogen and chlorine in SiO2 films thermally grown on silicon. These films have been grown in various ambients, including pure O2, steam, HCl/O2, and Cl2/O2, as well as HCl/O2 mixtures diluted with N2. The data suggest that there exists a strong interaction between the chlorine and the hydrogen, with the chlorine being a very effective gettering agent for hydrogen. The results of this investigation, as well as a model explaining the incorporation and distribution of the hydrogen and chlorine, are presented.

Author Information

Monkowski, JR
Pennsylvania State University, University Park, Pa.
Monkowski, MD
Pennsylvania State University, University Park, Pa.
Tsong, IST
Arizona State University, Tempe, Ariz.
Stach, J
Pennsylvania State University, University Park, Pa.
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Details
Developed by Committee: F01
Pages: 245–259
DOI: 10.1520/STP36172S
ISBN-EB: 978-0-8031-4871-0
ISBN-13: 978-0-8031-0243-9