STP804: Resist Profile Quality and Linewidth Control

    Neureuther, AR
    University of California, Berkeley, Calif.

    Pages: 17    Published: Jan 1983


    Abstract

    Key parameters and process tradeoffs in improving resist profile quality and linewidth control are explored for optical projection printing. Simulation with program SAMPLE is used to study the impact of image quality, wafer topography, and resist characteristics in the context of the complete lithographic process. The advantages of the use of a bias and of a “surface induction” resist are illustrated. The tradeoff between quality and throughput is explored as a function of the partial coherence factor. Practical rules of thumb are given for performance with single-layer thick resists. The potential improvements with multilayer and inorganic resists are also discussed.

    Keywords:

    linewidth control, photolithography, resist profile quality, optical projection printing, photoresists


    Paper ID: STP36162S

    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP36162S


    CrossRef ASTM International is a member of CrossRef.