SEDL / STP / STP850-EB / STP32682S



Ion Channeling Study of Damage in Neutron Transmutation Doped Semiconductors: Application to GaAs

Yahagi, M
LecturerStudentAssociate ProfessorProfessorAssociate ProfessorAssociate Professor, College of Engineering and Research Center of Ion Beam Technology, Hosei UniversityKorea UniversityInstitute for Atomic Energy, Rikkyo University, TokyoTokyoKanagawa,

Satoh, M
LecturerStudentAssociate ProfessorProfessorAssociate ProfessorAssociate Professor, College of Engineering and Research Center of Ion Beam Technology, Hosei UniversityKorea UniversityInstitute for Atomic Energy, Rikkyo University, TokyoTokyoKanagawa,

Kuriyama, K
LecturerStudentAssociate ProfessorProfessorAssociate ProfessorAssociate Professor, College of Engineering and Research Center of Ion Beam Technology, Hosei UniversityKorea UniversityInstitute for Atomic Energy, Rikkyo University, TokyoTokyoKanagawa,

Iwamura, K
LecturerStudentAssociate ProfessorProfessorAssociate ProfessorAssociate Professor, College of Engineering and Research Center of Ion Beam Technology, Hosei UniversityKorea UniversityInstitute for Atomic Energy, Rikkyo University, TokyoTokyoKanagawa,

Kim, C
LecturerStudentAssociate ProfessorProfessorAssociate ProfessorAssociate Professor, College of Engineering and Research Center of Ion Beam Technology, Hosei UniversityKorea UniversityInstitute for Atomic Energy, Rikkyo University, TokyoTokyoKanagawa,

Shiraishi, F
LecturerStudentAssociate ProfessorProfessorAssociate ProfessorAssociate Professor, College of Engineering and Research Center of Ion Beam Technology, Hosei UniversityKorea UniversityInstitute for Atomic Energy, Rikkyo University, TokyoTokyoKanagawa,


Pages: 8    Published: Jan 1984


Download this paper for $25 PDF (124K)          View License Agreement
Abstract

Neutron irradiation at a flux of 5 × 1011 neutrons /cm2 sec for 18 hr has been performed on n-type GaAs with 5.9 × 10−2Ω-cm (n= 2.1 × 1016/cm3). In annealing experiments for electrical properties, it is found that neutron irradiated-induced damages are removed by the annealing temperature at 800°C. The recovery of radiation damage is also confirmed from the improvement of photoluminescence for GaAs annealed at 800°C. The magnitude of the average displacement damage introduced during neutron irradiation is estimated to be 0.15 A by the measurement of Rutherford Backscattering channeling.


Keywords:
ion channeling, neutron irradiated GaAs, electrical properties, photoluminescence, displacement damage

Paper ID: STP32682S
Committee/Subcommittee: F01.15
DOI: 10.1520/STP32682S
CrossRef ASTM International is a member of CrossRef.