SYMPOSIA PAPER Published: 01 January 1984
STP32677S

Production and Development of Neutron Transmutation Doped Silicon

Source

Considering the production of NTD-silicon our interest is focussing on market growth, application fields and questions like reactor capacity, costs and material quality. Market growth still is in a further steady increase and since IC application particularly CMOS devices are not expected to turn over to NTD-silicon there is plenty of reactor capacity available to follow the market increase in power device application.

Further development of NTD-silicon is discussed regarding maximum diameter, upper resistivity limit and quality aspects.

Author Information

Herzer, H
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Details
Developed by Committee: F01
Pages: 533–545
DOI: 10.1520/STP32677S
ISBN-EB: 978-0-8031-4915-1
ISBN-13: 978-0-8031-0403-7