Published: Jan 1984
| ||Format||Pages||Price|| |
|PDF (176K)||13||$25||  ADD TO CART|
|Complete Source PDF (9.7M)||13||$66||  ADD TO CART|
Considering the production of NTD-silicon our interest is focussing on market growth, application fields and questions like reactor capacity, costs and material quality. Market growth still is in a further steady increase and since IC application particularly CMOS devices are not expected to turn over to NTD-silicon there is plenty of reactor capacity available to follow the market increase in power device application.
Further development of NTD-silicon is discussed regarding maximum diameter, upper resistivity limit and quality aspects.
float-zone silicon, neutron transmutation doping reactor capacity, maximum diameter, upper resistivity limit, crystal quality
Manager Float-Zone Silicon, Wacker-Chemitronic GmbH, Burghausen,