STP911: Plasma Deposited Inorganic Thin Films for Optical Applications

    Partlow, WD
    Westinghouse Research and Development Center, Pittsburgh, PA

    Heberlein, JVR
    Westinghouse Research and Development Center, Pittsburgh, PA

    Pages: 6    Published: Jan 1985


    Abstract

    Plasma deposited thin films, widely used in semiconductor processing, have begun to be used in optical applications such as anti-reflective coatings and optical waveguides. Amorphous films of refractory materials such as SiO2, SiC, and Si3N4 have been applied with high optical perfection on substrates at 200—300°C with this process. Control of index of refraction has been achieved by selecting appropriate deposition parameters.

    We describe the plasma deposition process and the properties of these coatings. We present applications and discuss how these coatings may be applied to more demanding optical applications in the future such as graded index films, rugate coatings, and vacuum UV reflecting films. We see that hydrogen inclusion in the films is a factor that must be controlled, and we propose methods to accomplish this.

    Keywords:

    optical, thin films, plasma, deposition, inorganic


    Paper ID: STP28996S

    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP28996S


    CrossRef ASTM International is a member of CrossRef.