STP911: Comparison of Optical Coatings Deposited by Novel Physical and Chemical Techniques

    Wodarczyk, FJ
    Rockwell International Science Center, Thousand Oaks, California

    Strauss, DR
    Rockwell International Science Center, Thousand Oaks, California

    Harker, AB
    Rockwell International Science Center, Thousand Oaks, California

    Pages: 10    Published: Jan 1985


    Abstract

    We have undertaken a systematic study of various methods of depositing good quality thin films of optically interesting materials by different physical and chemical methods in an effort to identify promising techniques for producing low-absorbing, low-scatter, high damage-threshold coatings. The deposition methods studied include e-beam deposition in a UHV environment, sol-gel processes utilizing hot isostatic pressing (HIP) to densify the films, photochemical deposition using organometallic reagents entrained in inert or potentially reactive gas flows, and ion-beam deposition in a reactive environment. The deposited single-layer films were analyzed using various surface analysis techniques to provide information on film composition, stoichiometry, and impurity level.

    Keywords:

    AIN, hot isostatic pressing, organometallic reagents, photochemical deposition, reactive ion beam, sol-gel, surface analysis, TiO, 2, ultrahigh vacuum


    Paper ID: STP28981S

    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP28981S


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