SYMPOSIA PAPER Published: 01 January 1981
STP28298S

Effect of Stable Crack Growth on Fracture Toughness Determination for Hot-Pressed Silicon Nitride at Elevated Temperatures

Source

Fracture toughness of hot-pressed silicon nitride was determined between room temperature and 1300°C using four-point bend specimens with straight-through and chevron notches. For T > 1100°C fracture toughness increases due to crack branching and secondary cracking caused by the viscous flow of the grain boundary phase. To determine correct K-values with the specimens having a straight-through notch the stable crack extension at T > 1100°C has to be taken into account.

Author Information

Munz, D
University of Karlsruhe, West Germany
Himsolt, G
Deutsche Forschungs-und Versuchsanstalt für Luft-und Raumfahrt, Cologne, West Germany
Eschweiler, J
Deutsche Forschungs-und Versuchsanstalt für Luft-und Raumfahrt, Cologne, West Germany
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Details
Developed by Committee: E08
Pages: 69–84
DOI: 10.1520/STP28298S
ISBN-EB: 978-0-8031-4811-6
ISBN-13: 978-0-8031-0731-1