STP1117: A High Temperature, Plasma-Assisted Chemical Vapor Deposition System

    Brusasco, RM
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Britten, JA
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Thorsness, CB
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Scrivener, MS
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Unites, WG
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Campbell, JH
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Johnson, WL
    University of California Lawrence Livermore National Laboratory, Livermore, CA

    Pages: 12    Published: Jan 1990


    Abstract

    We have designed and built a high-temperature, plasma-assisted, chemical vapor deposition system to deposit multilayer optical coatings of SiO2 and doped-SiO2 on flat substrates. The coater concept and design is an outgrowth of our recent work with Schott Glaswerke demonstrating the use of plasma assisted CVD to prepare very high damage threshold optical coatings. (That work is reported in a companion paper at this Symposium).


    Paper ID: STP26512S

    Committee/Subcommittee: E13.15

    DOI: 10.1520/STP26512S


    CrossRef ASTM International is a member of CrossRef.