STP1117: Damage Resistant Optical Coatings Prepared Using High Temperature, Plasma Chemical-Vapor-Deposition

    Campbell, JH
    University of California Lawrence Livermore National Laboratory, Livermore, California

    Emmett, JL
    University of California Lawrence Livermore National Laboratory, Livermore, California

    Brusasco, RM
    University of California Lawrence Livermore National Laboratory, Livermore, California

    Rainer, F
    University of California Lawrence Livermore National Laboratory, Livermore, California

    Kersten, RT
    University of California Lawrence Livermore National Laboratory, Livermore, California

    Paquet, V
    University of California Lawrence Livermore National Laboratory, Livermore, California

    Etzkorn, H-W
    University of California Lawrence Livermore National Laboratory, Livermore, California

    Pages: 17    Published: Jan 1990


    Abstract

    Multilayer dielectric optical coatings, nominally consisting of 1000 or more optical-quarterwave layers, have been prepared by reacting SiCl4 and a halogenated dopant (e.g. GeCl4) with O2 in a microwave-driven plasma. The dopant concentration is such that the index difference (An) between adjacent quarterwave layers is about 0.02 or less. The deposition is carried out at high substrate temperatures (850 to 1100°C) producing a fully dense, fused silica coating. Surface damage thresholds of high reflectivity (HR) coatings prepared by this plasma process are comparable to those for fused silica. For example, at 1.06 μm and 16-ns we measure surface damage thresholds greater than 45 J/cm2 compared to about 45–60 J/cm2 for super-polished optical fused silica.


    Paper ID: STP26511S

    Committee/Subcommittee: E13.15

    DOI: 10.1520/STP26511S


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