STP1117

    Angular Dependence of Thin-Film Dielectric Coating Damage Thresholds Revisited

    Published: Jan 1990


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    Abstract

    Newnam et al. [1] reported experiments showing that the angular dependence of 351-nm laser damage thresholds in HfO2/SiO2 multilayer dielectric reflectors was much weaker than even the 1/cosθ expected from simple geometric fluence dilution. Several plausible explanations were suggested, but none were convincing. We propose a simple geometric model based on a cylindrical form for the coating defect responsible for damage initiation. We have measured 248-nm damage thresholds for bare fused silica, evaporated aluminium films, and HfO2/SiO2 and Al2O3/SiO2 dielectric reflectors at angles out to 85°. The measured data agree well with our simple model.

    Keywords:

    angular dependence, aluminium oxide, coating defects, evaporated aluminium, fused silica, hafnium oxide, laser damage thresholds, multilayer dielectric reflectors, silicon dioxide


    Author Information:

    Boyer, JD
    Los Alamos National Laboratory, Los Alamos, New Mexico

    Foltyn, SR
    Los Alamos National Laboratory, Los Alamos, New Mexico

    Mauro, BR
    Los Alamos National Laboratory, Los Alamos, New Mexico

    Sanders, VE
    Los Alamos National Laboratory, Los Alamos, New Mexico


    Paper ID: STP26509S

    Committee/Subcommittee: E13.15

    DOI: 10.1520/STP26509S


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