STP1117: Scattering Characterization of Materials in Thin Film Form

    Amra, C
    Laboratoire d'Optique des Surfaces et des Couches Minces — Unité Associée au CNRS — Ecole Nationale Supérieure de Physique de Marseille — Domaine Universitaire de St Jérôme, Marseille,

    Pages: 15    Published: Jan 1990


    Abstract

    The “scattering characterization” that was developed in Marseilles enables us today, with the help of complementary tools (causal model, isotropy degree, …), to point out the origin of micro-roughness in optical coatings without any ambiguity. Each material can be associated to a key parameter that characterizes its scattering. These parameters can be determined through measurements performed on one single layer, and then can be used to predict scattering in more complex systems.

    Experimental results (IAD, IP) are presented and show that in most cases, scattering measurement of substrate is sufficient to predict scattering from any coating with a high accuracy. However, at very low scattering levels (under 10-6), this prediction is limited by the presence of local defects in the coatings.

    Keywords:

    cross-correlation laws, Ion Assisted Deposition, isotropy degree, local defects, microroughness, optical coatings, scattering, thin films


    Paper ID: STP26500S

    Committee/Subcommittee: E13.15

    DOI: 10.1520/STP26500S


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