SEDL / STP / STP1117-EB / STP26484S

The Effect of Laser Annealing on Laser Induced Damage Threshold

Kerr, NC
Loughborough University of Technology, Loughborough,Leicestershire

Emmony, DC
Loughborough University of Technology, Loughborough,Leicestershire

Pages: 16    Published: Jan 1990

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Source: STP1117-EB

Abstract

A significant enhancement of the single shot Laser Induced Damage Threshold of CaF² and fused silica and a moderate enhancement for GaAs and Al has been observed as the result of laser annealing using an excimer laser operating at 248 nm. This phenomenon is primarily attributed to a reduction of the residual surface roughness of the samples.

Keywords:
Excimer laser, Laser beam annealing, Laser induced damage

Paper ID: STP26484S
Committee/Subcommittee: E13.15
DOI: 10.1520/STP26484S
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