STP990

    Perkin-Elmer 544 Overlay Evaluation Using Statistical Techniques

    Published: Jan 1989


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    Abstract

    A recently developed optical overlay measurement system is used to perform factorial design statistical experiments on the Perkin-Elmer 544 Micralign. The overlay measurement system (Perkin-Elmer's OMS-1) is used to check out the operation of computer offsets and microstage scale corrections in the Micralign 544 with a half fractional factorial test for five factors. This is a resolution five experiment. OMS-1 compares a resist image to a previously etched substrate. This offers fast turnaround time and contactless measurement of product wafers. We have found that with a minimum of equipment utilization, a Perkin-Elmer scanner can be checked out for operation on many different programmable settings. Experimental data is reported in real time since the development step is the only process required before wafers are measured. Information will also be presented on the functionality of the OMS-1 with respect to reproducibility and repeatability. The Perkin-Elmer scanner is tested for stability over time using the OMS. Also, we demonstrate efficiency of the OMS in overlay measurement processing and a method to evaluate the alignment distribution offsets needed to achieve optimal registration.

    Keywords:

    overlay, registration, factorial, gauge, capability


    Author Information:

    Keller, GA
    process development engineer specializing in optical photolithographystepper process development engineer for 0.5 micron optical lithographyapplications engineer, Motorola's Bipolar Technology CenterMotorola's Bipolar Technology CenterPerkin-Elmer's Semiconductor Equipment Division,

    Waldo, WG
    process development engineer specializing in optical photolithographystepper process development engineer for 0.5 micron optical lithographyapplications engineer, Motorola's Bipolar Technology CenterMotorola's Bipolar Technology CenterPerkin-Elmer's Semiconductor Equipment Division,

    Babasick, RF
    process development engineer specializing in optical photolithographystepper process development engineer for 0.5 micron optical lithographyapplications engineer, Motorola's Bipolar Technology CenterMotorola's Bipolar Technology CenterPerkin-Elmer's Semiconductor Equipment Division,


    Paper ID: STP26057S

    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP26057S


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