SYMPOSIA PAPER Published: 01 January 1989
STP26057S

Perkin-Elmer 544 Overlay Evaluation Using Statistical Techniques

Source

A recently developed optical overlay measurement system is used to perform factorial design statistical experiments on the Perkin-Elmer 544 Micralign. The overlay measurement system (Perkin-Elmer's OMS-1) is used to check out the operation of computer offsets and microstage scale corrections in the Micralign 544 with a half fractional factorial test for five factors. This is a resolution five experiment. OMS-1 compares a resist image to a previously etched substrate. This offers fast turnaround time and contactless measurement of product wafers. We have found that with a minimum of equipment utilization, a Perkin-Elmer scanner can be checked out for operation on many different programmable settings. Experimental data is reported in real time since the development step is the only process required before wafers are measured. Information will also be presented on the functionality of the OMS-1 with respect to reproducibility and repeatability. The Perkin-Elmer scanner is tested for stability over time using the OMS. Also, we demonstrate efficiency of the OMS in overlay measurement processing and a method to evaluate the alignment distribution offsets needed to achieve optimal registration.

Author Information

Keller, GA
Waldo, WG
Babasick, RF
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Details
Developed by Committee: F01
Pages: 427–441
DOI: 10.1520/STP26057S
ISBN-EB: 978-0-8031-5107-9
ISBN-13: 978-0-8031-1273-5