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Epitaxial Silicon Quality Improvement by Automatic Surface Inspection Pages: 9 Published: Jan 1989
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View License Agreement Source: STP990-EB Abstract With increasing demands on epitaxial wafer surface quality, automated inspection is necessary. The results from automatic wafer inspection equipment are ambiguous without careful examination of the detected defects. To facilitate microscopic verification of automatically detected defects, we have designed a system for matching flaw counts to actual defects. Using this system, the epitaxial deposition process has been optimized to reduce surface defects. Keywords: silicon epitaxy, defect inspection, microscopic inspection, automated inspection, surface quality Paper ID: STP26031S Committee/Subcommittee: F01.06 DOI: 10.1520/STP26031S ASTM International is a member of CrossRef. | ||