STP990

    Epitaxial Silicon Quality Improvement by Automatic Surface Inspection

    Published: Jan 1989


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    Abstract

    With increasing demands on epitaxial wafer surface quality, automated inspection is necessary. The results from automatic wafer inspection equipment are ambiguous without careful examination of the detected defects. To facilitate microscopic verification of automatically detected defects, we have designed a system for matching flaw counts to actual defects. Using this system, the epitaxial deposition process has been optimized to reduce surface defects.

    Keywords:

    silicon epitaxy, defect inspection, microscopic inspection, automated inspection, surface quality


    Author Information:

    Ruprecht, DJ
    Monsanto Electronic Materials Company, Saint Peters, Missouri

    Hellwig, LG
    Monsanto Electronic Materials Company, Saint Peters, Missouri

    Rossi, JA
    Monsanto Electronic Materials Company, Saint Peters, Missouri


    Paper ID: STP26031S

    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP26031S


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