STP960

    Particulate Control in VLSI Gases

    Published: Jan 1987


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    Abstract

    Semiconductor device miniaturization has required continually decreasing levels of particulate contamination in process gases. This paper briefly reviews existing technologies for analyzing and for minimizing particles in VLSI gas streams. Recent advances and research topics in both areas are also addressed. Examples from laboratory and field evaluations of VLSI and non-VLSI systems are discussed.

    Keywords:

    gases, particles, contamination, filtration


    Author Information:

    Davidson, JM
    Senior Scientist and Senior Physicist, The BOC Group, Inc., Group Technical Center, Murray Hill, NJ

    Ruane, TP
    Senior Scientist and Senior Physicist, The BOC Group, Inc., Group Technical Center, Murray Hill, NJ


    Paper ID: STP25782S

    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP25782S


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