STP960: Particulate Control in VLSI Gases

    Davidson, JM
    Senior Scientist and Senior Physicist, The BOC Group, Inc., Group Technical Center, Murray Hill, NJ

    Ruane, TP
    Senior Scientist and Senior Physicist, The BOC Group, Inc., Group Technical Center, Murray Hill, NJ

    Pages: 15    Published: Jan 1987


    Abstract

    Semiconductor device miniaturization has required continually decreasing levels of particulate contamination in process gases. This paper briefly reviews existing technologies for analyzing and for minimizing particles in VLSI gas streams. Recent advances and research topics in both areas are also addressed. Examples from laboratory and field evaluations of VLSI and non-VLSI systems are discussed.

    Keywords:

    gases, particles, contamination, filtration


    Paper ID: STP25782S

    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP25782S


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