STP960: Characterization of Silicon Surface Defects by the Laser Scanning Technique

    Liaw, HM
    senior member of the technical staff and section managerprincipal staff engineer and a manager for the epitaxial development programprocess engineer, Semiconductor Research and Development Labs (SRDL)Electronic Materials OperationSRDL, Motorola, Inc. Semiconductor Products Sector, Phoenix, Arizona

    Rose, JW
    senior member of the technical staff and section managerprincipal staff engineer and a manager for the epitaxial development programprocess engineer, Semiconductor Research and Development Labs (SRDL)Electronic Materials OperationSRDL, Motorola, Inc. Semiconductor Products Sector, Phoenix, Arizona

    Nguyen, HT
    senior member of the technical staff and section managerprincipal staff engineer and a manager for the epitaxial development programprocess engineer, Semiconductor Research and Development Labs (SRDL)Electronic Materials OperationSRDL, Motorola, Inc. Semiconductor Products Sector, Phoenix, Arizona

    Pages: 16    Published: Jan 1987


    Abstract

    The increase of circuit complexity in an IC chip has greatly increased the cost of processed wafers. The cost can be reduced if the defective wafers which cause the poor process yields can be screened prior to the wafer processing. Recent advanced in laser optics and data processing have made automatic laser scanners available. The laser scanners can be potentially used for 100% of the screening of incoming wafers and as a process control tool for certain steps of wafer processing. This paper reports (1) the correlation of defects detected by the laser scanner with the physical nature of defects, (2) utilization of the laser scanner for the characterization of process-induced defects, and (3) utilization of the laser scanner for monitoring substrate cleaning and epitaxial growth processes.

    Keywords:

    wafer inspection, laser scanner, surface defects, epitaxial silicon


    Paper ID: STP25762S

    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP25762S


    CrossRef ASTM International is a member of CrossRef.