Published: Jan 1987
| ||Format||Pages||Price|| |
|PDF Version (140K)||8||$25||  ADD TO CART|
|Complete Source PDF (9.4M)||8||$70||  ADD TO CART|
A mathematical model of a CVD reactor is presented, from which performance criteria such as deposition uniformity, and reactor productivity, may be obtained in terms of design and operating parameters. An example is presented in which the interwafer spacing, and the number of wafers to be processed as a single batch, are determined to maximize productivity while maintaining a constraint on uniformity.
reactor design, CVD, uniformity, productivity
Professor of Chemical Engineering, University of California, La Jolla, CA
Paper ID: STP25746S