STP960

    Some Aspects of Productivity of a Low Pressure CVD Reactor

    Published: Jan 1987


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    Abstract

    A mathematical model of a CVD reactor is presented, from which performance criteria such as deposition uniformity, and reactor productivity, may be obtained in terms of design and operating parameters. An example is presented in which the interwafer spacing, and the number of wafers to be processed as a single batch, are determined to maximize productivity while maintaining a constraint on uniformity.

    Keywords:

    reactor design, CVD, uniformity, productivity


    Author Information:

    Middleman, S
    Professor of Chemical Engineering, University of California, La Jolla, CA


    Paper ID: STP25746S

    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP25746S


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