STP960

    Measurements of Cross-Contamination Levels Produced by Ion Implanters

    Published: Jan 1987


      Format Pages Price  
    PDF Version (152K) 10 $25   ADD TO CART
    Complete Source PDF (9.4M) 10 $70   ADD TO CART


    Abstract

    The contamination of implants by other species previously used in the same machine has been shown to be of significant concern for high-dose implants. This paper reports the results of a survey of the contamination levels extant in high-volume production implanters. Two classes of machines are represented. The first includes machines where wafer holders have been dedicated to a particular species. The second is machines where no precautions regarding cross-contamination have been taken. The machines have different production histories, especially for different species, and it is felt that the range of contamination levels reported is typical of what might be seen.

    Keywords:

    Ion implantation, contamination, Rutherford Backscattering Spectroscopy, Auger Electron Spectroscopy


    Author Information:

    Larson, LA
    Engineering Section Head and Member Technical Staff, National Semiconductor Corp., Santa Clara, CA

    Kirby, BJ
    Engineering Section Head and Member Technical Staff, National Semiconductor Corp., Santa Clara, CA


    Paper ID: STP25745S

    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP25745S


    CrossRef ASTM International is a member of CrossRef.