SEDL / STP / STP1038-EB / STP24419S

UV Light Cleaning of Silica Surfaces for Improved Laser Damage of AR Coatings

Yoshida, K
Institute of Laser Engineering, Osaka University, Osaka,

Yoshida, H
Institute of Laser Engineering, Osaka University, Osaka,

Kato, Y
Institute of Laser Engineering, Osaka University, Osaka,

Nakai, S
Institute of Laser Engineering, Osaka University, Osaka,

Ohtani, M
Institute of Laser Engineering, Osaka University, Osaka,

Pages: 1    Published: Jan 1988

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Abstract

The glass substrates for the optical coatings have many contaminations on the surface which can not be removed by standard optical cleaning techniques. Especially, it is very difficult to remove the polishing compound which is buried into the silica substrates.

In this report, the improvement of laser damage threshold due to UV light cleaning is presented. The excimer laser, Xe flashlamps, and Xe arc-lamp have been used as UV light sources. The damage threshold of the AR coating on the silica surface which was cleaned with KrF laser light has increased by 50% at 355 nm.