STP1141

    Laser-Induced Damage of Diamond Films

    Published: Jan 1991


      Format Pages Price  
    PDF (492K) 15 $25   ADD TO CART
    Complete Source PDF (19M) 15 $88   ADD TO CART


    Abstract

    The laser-induced damage thresholds of diamond films deposited on silicon substrates were investigated. Experiments were performed with both CW and pulsed lasers operating at a wavelength of 10.6 μm. Analytical studies were conducted to determine the thermal and thermomechanical states, as well as the electric field strengths, of the films and the substrates at the damage thresholds in an effort to identify the damage mechanism. The evidence suggests that the diamond films are damaged by stress-induced cracking which occurs when the underlying silicon approaches melt.


    Author Information:

    Read, HE
    S-CUBED Division of Maxwell Laboratories, La Jolla, California

    Merker, M
    S-CUBED Division of Maxwell Laboratories, La Jolla, California

    Gurtman, GA
    S-CUBED Division of Maxwell Laboratories, La Jolla, California

    Wilson, RS
    S-CUBED Division of Maxwell Laboratories, La Jolla, California


    Paper ID: STP23642S

    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP23642S


    CrossRef ASTM International is a member of CrossRef.