SEDL / STP / STP1141-EB / STP23629S

Morphology and Laser Damage Studies by Atomic Force Microscopy of E-Beam Evaporation Deposited AR and HR Coatings

Tesar, AA
Lawrence Livermore National Laboratory, Livermore, CA

Balooch, M
Lawrence Livermore National Laboratory, Livermore, CA

Shotts, KW
Lawrence Livermore National Laboratory, Livermore, CA

Siekhaus, WJ
Lawrence Livermore National Laboratory, Livermore, CA

Pages: 9    Published: Jan 1991

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Abstract

Atomic Force Microscopy is a powerful tool for exploring the surface morphology of dielectric thin film coatings. We have demonstrated the utility of this tool in monitoring processing defects, laser conditioning and aging, and laser damage in e-beam evaporation deposited AR and HR coatings with a resolution not previously available.