STP1141: Photoacoustic Characterization of Surface Absorption

    Reicher, DW
    University of New Mexico Center for High Technology Materials, Albuquerque, N. M.

    Wilson, SR
    University of New Mexico Center for High Technology Materials, Albuquerque, N. M.

    Kranenberg, CF
    University of New Mexico Center for High Technology Materials, Albuquerque, N. M.

    Raja, MYA
    University of North Carolina at Charlotte, Charlotte, N. C.

    McNeil, JR
    University of New Mexico Center for High Technology Materials, Albuquerque, N. M.

    Brueck, SRJ
    University of New Mexico Center for High Technology Materials, Albuquerque, N. M.

    Pages: 7    Published: Jan 1991


    Abstract

    Photoacoustic spectrososcopy is used to characterize the surface absorption of polished fused silica substrates and thin films deposited on fused silica substrates. The extreme sensitivity of this technique allows measurement of surface absorptions of a few tenths of a part per million. Characterization of samples with surfaces finished using a variety of methods is reported.

    Keywords:

    Photoacoustic, ion beam, absorption, thin films


    Paper ID: STP23618S

    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP23618S


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