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Photoacoustic Characterization of Surface Absorption
Reicher, DW
University of New Mexico Center for High Technology Materials, N. M.

Wilson, SR
University of North Carolina at Charlotte, N. C.

Kranenberg, CF

Raja, MYA

McNeil, JR

Brueck, SRJ

Pages: 7    Published: Jan 1991

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Source: STP1141-EB

Abstract

Photoacoustic spectrososcopy is used to characterize the surface absorption of polished fused silica substrates and thin films deposited on fused silica substrates. The extreme sensitivity of this technique allows measurement of surface absorptions of a few tenths of a part per million. Characterization of samples with surfaces finished using a variety of methods is reported.

Keywords:
Photoacoustic, ion beam, absorption, thin films

Paper ID: STP23618S
Committee/Subcommittee: F01.19
DOI: 10.1520/STP23618S
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