STP954

    Ultraviolet Thin Film Coating Characterization

    Published: Jan 1986


      Format Pages Price  
    PDF Version (200K) 13 $25   ADD TO CART
    Complete Source PDF (8.6M) 13 $66   ADD TO CART


    Abstract

    Multilayer dielectric high reflectance coatings designed for 351nm were fabricated using ion beam sputtering and electron beam deposition on super polished silicon substrates. These optics were evaluated in terms of total integrated scatter levels, absorption, reflectance and laser induced damage thresholds. Ion beam sputtering was found to produce optics with the lowest losses while electron beam deposited coatings demonstrated higher laser damage thresholds.

    Keywords:

    Absorption, calorimetry, laser damage, reflectance, roughness, silicon, total integrated scattering, 351nm


    Author Information:

    Stewar, AF
    AFWL/ARBE, Kirtland AFB, NM

    Gallant, DJ
    AFWL/ARBE, Kirtland AFB, NM


    Paper ID: STP23128S

    Committee/Subcommittee: E13.01

    DOI: 10.1520/STP23128S


    CrossRef ASTM International is a member of CrossRef.