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    Ultraviolet Thin Film Coating Characterization

    Published: Jan 1986

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    Multilayer dielectric high reflectance coatings designed for 351nm were fabricated using ion beam sputtering and electron beam deposition on super polished silicon substrates. These optics were evaluated in terms of total integrated scatter levels, absorption, reflectance and laser induced damage thresholds. Ion beam sputtering was found to produce optics with the lowest losses while electron beam deposited coatings demonstrated higher laser damage thresholds.


    Absorption, calorimetry, laser damage, reflectance, roughness, silicon, total integrated scattering, 351nm

    Author Information:

    Stewar, AF
    AFWL/ARBE, Kirtland AFB, NM

    Gallant, DJ
    AFWL/ARBE, Kirtland AFB, NM

    Committee/Subcommittee: E13.01

    DOI: 10.1520/STP23128S

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