SEDL / STP / STP954-EB / STP23122S



High Damage Threshold Porous Silica Antireflective Coating

Thomas, IM
Lawrence Livermore National Laboratory, Livermore, California

Wilder, JG
Lawrence Livermore National Laboratory, Livermore, California

Lowdermilk, WH
Lawrence Livermore National Laboratory, Livermore, California

Staggs, MC
Lawrence Livermore National Laboratory, Livermore, California


Pages: 6    Published: Jan 1986


Download this paper for $25 PDF (88K)          View License Agreement
Abstract

A quarterwave-thick, narrow-bandwidth, antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates.


Keywords:
antireflection coatings, laser damage, tetraethyl orthosilicate, silica sols, fused silica, potassium dihydrogen phosphate

Paper ID: STP23122S
Committee/Subcommittee: F01.06
DOI: 10.1520/STP23122S
CrossRef ASTM International is a member of CrossRef.