STP954: High Damage Threshold Porous Silica Antireflective Coating

    Thomas, IM
    Lawrence Livermore National Laboratory, Livermore, California

    Wilder, JG
    Lawrence Livermore National Laboratory, Livermore, California

    Lowdermilk, WH
    Lawrence Livermore National Laboratory, Livermore, California

    Staggs, MC
    Lawrence Livermore National Laboratory, Livermore, California

    Pages: 6    Published: Jan 1986


    Abstract

    A quarterwave-thick, narrow-bandwidth, antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates.

    Keywords:

    antireflection coatings, laser damage, tetraethyl orthosilicate, silica sols, fused silica, potassium dihydrogen phosphate


    Paper ID: STP23122S

    Committee/Subcommittee: F01.06

    DOI: 10.1520/STP23122S


    CrossRef ASTM International is a member of CrossRef.