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High Damage Threshold Porous Silica Antireflective Coating Pages: 6 Published: Jan 1986
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View License Agreement A quarterwave-thick, narrow-bandwidth, antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates. | ||