STP954

    Some Recent Observations on the Properties of UHV-Deposited ZrO2

    Published: Jan 1986


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    Abstract

    Single-layer ZrO2 coatings were deposited in an ultrahigh vacuum system by two techniques: laser evaporation (utilizing a 100-W, continuous wave, CO2 laser) and electron-beam evaporation. Substrate temperatures were maintained at either 150°C or 250°C with backfill oxygen pressures between 0 and 5×10−5 torr. The coatings were analyzed by Auger Electron Spectroscopy to determine stoichiometry and to provide information on the nature and level of impurities. The refractive indices for the coatings were determined by ellipsometry at 6328 Å. Selected coatings were damage tested at 531 nm.

    This report discusses the influence of backfill pressure, substrate temperature and evaporation technique on thin film properties and compares the results obtained by Auger and ellipsometric analyses. Also presented is a comparison between films prepared under high vacuum and ultrahigh vacuum conditions.

    Keywords:

    damage threshold, impurities, optical thin films, refractive index, stoichiometry, ultrahigh vacuum, ZrO, 2


    Author Information:

    Raj, T
    Martin Marietta Aerospace, Albuquerque, New Mexico

    Weaver, LD
    Martin Marietta Aerospace, Albuquerque, New Mexico

    Tuenge, SR
    Martin Marietta Aerospace, Albuquerque, New Mexico

    Price, JS
    Martin Marietta Aerospace, Albuquerque, New Mexico

    Jungling, KC
    Martin Marietta Aerospace, Albuquerque, New Mexico


    Paper ID: STP23119S

    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP23119S


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