SEDL / STP / STP954-EB / STP23119S

Some Recent Observations on the Properties of UHV-Deposited ZrO²

Raj, T
Martin Marietta Aerospace, Albuquerque, New Mexico

Weaver, LD
Martin Marietta Aerospace, Albuquerque, New Mexico

Tuenge, SR
Martin Marietta Aerospace, Albuquerque, New Mexico

Price, JS
Martin Marietta Aerospace, Albuquerque, New Mexico

Jungling, KC
Martin Marietta Aerospace, Albuquerque, New Mexico

Pages: 9    Published: Jan 1986

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Abstract

Single-layer ZrO² coatings were deposited in an ultrahigh vacuum system by two techniques: laser evaporation (utilizing a 100-W, continuous wave, CO² laser) and electron-beam evaporation. Substrate temperatures were maintained at either 150°C or 250°C with backfill oxygen pressures between 0 and 5×10⁻⁵ torr. The coatings were analyzed by Auger Electron Spectroscopy to determine stoichiometry and to provide information on the nature and level of impurities. The refractive indices for the coatings were determined by ellipsometry at 6328 Å. Selected coatings were damage tested at 531 nm.

This report discusses the influence of backfill pressure, substrate temperature and evaporation technique on thin film properties and compares the results obtained by Auger and ellipsometric analyses. Also presented is a comparison between films prepared under high vacuum and ultrahigh vacuum conditions.