STP1015

    Influence of Deposition and Post Deposition Conditions on Laser Induced Damage in Electron Beam Evaporated TiO2 and SiO2 Films

    Published: Jan 1988


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    Abstract

    Composition and structure of oxide films vary with different deposition techniques, conditions and starting materials, resulting in different damage thresholds. In this investigation, single and multi layer films of TiO2 and SiO2 were deposited with TiO and SiO2 as starting materials. The substrate temperatures were maintained 25, 75, 125 and 175 ° C and post heat treatment was carried out at 75, 125, 175 and 225° C in air. These films were subjected to laser damage threshold studies, using Q-switched Nd:YAG Laser of 8 to 9ns. pulse width.

    Maximum threshold values obtained were 19 J/cm2 for TiO2 films deposited at 25 °C and post heated at 75 °C; 44J/cm2 for SiO2 film deposited at 25 °C and 18J/cm2 for multilayer stacks of TiO2/SiO2 deposited at 25 °C. Variation in damage threshold values is explained on the basis of film composition, structure and optical properties.

    Keywords:

    electron beam evaporation, laser induced damage, multilayers, optical properties, post deposition heat treatment, TiO, 2, and SiO, 2, films


    Author Information:

    Rao, KN
    Instrumentation and Services Unit Indian Institute of Science, Bangalore, Karnataka,

    Murthy, MA
    Instrumentation and Services Unit Indian Institute of Science, Bangalore, Karnataka,

    Mohan, S
    Instrumentation and Services Unit Indian Institute of Science, Bangalore, Karnataka,

    Rao, MR
    Instrumentation and Services Unit Indian Institute of Science, Bangalore, Karnataka,


    Paper ID: STP18784S

    Committee/Subcommittee: F01.11

    DOI: 10.1520/STP18784S


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