SYMPOSIA PAPER Published: 01 January 1988
STP18784S

Influence of Deposition and Post Deposition Conditions on Laser Induced Damage in Electron Beam Evaporated TiO and SiO Films

Source

Composition and structure of oxide films vary with different deposition techniques, conditions and starting materials, resulting in different damage thresholds. In this investigation, single and multi layer films of TiO2 and SiO2 were deposited with TiO and SiO2 as starting materials. The substrate temperatures were maintained 25, 75, 125 and 175 ° C and post heat treatment was carried out at 75, 125, 175 and 225° C in air. These films were subjected to laser damage threshold studies, using Q-switched Nd:YAG Laser of 8 to 9ns. pulse width.

Maximum threshold values obtained were 19 J/cm2 for TiO2 films deposited at 25 °C and post heated at 75 °C; 44J/cm2 for SiO2 film deposited at 25 °C and 18J/cm2 for multilayer stacks of TiO2/SiO2 deposited at 25 °C. Variation in damage threshold values is explained on the basis of film composition, structure and optical properties.

Author Information

Rao, KN
Murthy, MA
Mohan, S
Rao, MR
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Details
Developed by Committee: F01
Pages: 429–437
DOI: 10.1520/STP18784S
ISBN-EB: 978-0-8031-5031-7
ISBN-13: 978-0-8031-4479-8