STP1015

    Thresholds Measured With 350-nm Pulses at 25–100 Hz for Bare Polished Crystals of CaF2 and for Silica Sol-gel AR Coatings on Silica Substrates

    Published: Jan 1988


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    Abstract

    An XeF laser-damage experiment was used to measure damage thresholds for bare polished crystals of CaF2 and porous silica antireflection coatings on fused silica substrates. Damage was induced by applying 1000 350-nm, 25-ns pulses at repetition rates of 25–100 Hz to small (typically 0.12 × .03 cm) sites on the surfaces of the sample. Eight samples of fluorescence-free CaF2 exhibited both surface and bulk damage at fluences as low as 10 J/cm2. Three samples of UV-grade CaF2 also had surface damage thresholds of 10 J/cm2, and bulk damage was not observed in this material. Thresholds for the porous silica coatings were 17–23 J/cm2.

    Keywords:

    calcium fluoride, multishot damage testing, porous silica antireflection coatings, ultraviolet laser damage


    Author Information:

    Staggs, MC
    Lawrence Livermore National Laboratory University of California, Livermore, California

    Milam, D
    Lawrence Livermore National Laboratory University of California, Livermore, California

    Thomas, IM
    Lawrence Livermore National Laboratory University of California, Livermore, California

    Wilder, JG
    Lawrence Livermore National Laboratory University of California, Livermore, California


    Paper ID: STP18780S

    Committee/Subcommittee: F01.11

    DOI: 10.1520/STP18780S


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