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Ion Beam Characterization of Multi-Layer Dielectric Reflectors Pages: 7 Published: Jan 1988
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View License Agreement Source: STP1015-EB Abstract Energetic ion beams were used to characterize multilayer dielectric reflectors. Alpha-particle beams with beam spot sizes between 10 microns and a few millimeters were scattered from reflectors consisting of 32-layer SiO2/HfO2 and 38-layer MgF2/ThF4. The RBS spectra reveal the nature of the laser damage processes by providing information on diffusion, mixing, and loss of material in the coatings. The particle-induced x-ray emission (PIXE) technique gave complimentary results on low-concentration impurities in the coatings. Keywords: dielectric reflectors, nuclear microprobe, particle-induced x-ray emission, Rutherford backseattering Paper ID: STP18770S Committee/Subcommittee: F01.11 DOI: 10.1520/STP18770S ASTM International is a member of CrossRef. | ||