STP1015

    Ion Beam Characterization of Multi-Layer Dielectric Reflectors

    Published: Jan 1988


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    Abstract

    Energetic ion beams were used to characterize multilayer dielectric reflectors. Alpha-particle beams with beam spot sizes between 10 microns and a few millimeters were scattered from reflectors consisting of 32-layer SiO2/HfO2 and 38-layer MgF2/ThF4. The RBS spectra reveal the nature of the laser damage processes by providing information on diffusion, mixing, and loss of material in the coatings. The particle-induced x-ray emission (PIXE) technique gave complimentary results on low-concentration impurities in the coatings.

    Keywords:

    dielectric reflectors, nuclear microprobe, particle-induced x-ray emission, Rutherford backseattering


    Author Information:

    Beery, JG
    Los Alamos National Laboratory, Los Alamos, NM

    Hollander, MG
    Los Alamos National Laboratory, Los Alamos, NM

    Maggiore, CJ
    Los Alamos National Laboratory, Los Alamos, NM

    Redondo, A
    Los Alamos National Laboratory, Los Alamos, NM

    Westervelt, RT
    Los Alamos National Laboratory, Los Alamos, NM

    Taylor, TN
    Los Alamos National Laboratory, Los Alamos, NM


    Paper ID: STP18770S

    Committee/Subcommittee: F01.11

    DOI: 10.1520/STP18770S


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