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Ion Beam Characterization of Multi-Layer Dielectric Reflectors
Beery, JG
Los Alamos National Laboratory, NM

Hollander, MG
Los Alamos National Laboratory, NM

Maggiore, CJ
Los Alamos National Laboratory, NM

Redondo, A
Los Alamos National Laboratory, NM

Westervelt, RT
Los Alamos National Laboratory, NM

Taylor, TN
Los Alamos National Laboratory, NM

Pages: 7    Published: Jan 1988

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Source: STP1015-EB

Abstract

Energetic ion beams were used to characterize multilayer dielectric reflectors. Alpha-particle beams with beam spot sizes between 10 microns and a few millimeters were scattered from reflectors consisting of 32-layer SiO2/HfO2 and 38-layer MgF2/ThF4. The RBS spectra reveal the nature of the laser damage processes by providing information on diffusion, mixing, and loss of material in the coatings. The particle-induced x-ray emission (PIXE) technique gave complimentary results on low-concentration impurities in the coatings.

Keywords:
dielectric reflectors, nuclear microprobe, particle-induced x-ray emission, Rutherford backseattering

Paper ID: STP18770S
Committee/Subcommittee: F01.11
DOI: 10.1520/STP18770S
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