STP1015: Ion Beam Characterization of Multi-Layer Dielectric Reflectors

    Beery, JG
    Los Alamos National Laboratory, Los Alamos, NM

    Hollander, MG
    Los Alamos National Laboratory, Los Alamos, NM

    Maggiore, CJ
    Los Alamos National Laboratory, Los Alamos, NM

    Redondo, A
    Los Alamos National Laboratory, Los Alamos, NM

    Westervelt, RT
    Los Alamos National Laboratory, Los Alamos, NM

    Taylor, TN
    Los Alamos National Laboratory, Los Alamos, NM

    Pages: 7    Published: Jan 1988


    Abstract

    Energetic ion beams were used to characterize multilayer dielectric reflectors. Alpha-particle beams with beam spot sizes between 10 microns and a few millimeters were scattered from reflectors consisting of 32-layer SiO2/HfO2 and 38-layer MgF2/ThF4. The RBS spectra reveal the nature of the laser damage processes by providing information on diffusion, mixing, and loss of material in the coatings. The particle-induced x-ray emission (PIXE) technique gave complimentary results on low-concentration impurities in the coatings.

    Keywords:

    dielectric reflectors, nuclear microprobe, particle-induced x-ray emission, Rutherford backseattering


    Paper ID: STP18770S

    Committee/Subcommittee: F01.11

    DOI: 10.1520/STP18770S


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