SEDL / STP / STP1015-EB / STP18768S

Ion Assisted Deposition of Optical Films on Heavy Metal Fluoride Glass Substrates

McNally, JJ
University of New Mexico, Albuquerque, NM

Al-Jumaily, GA
University of New Mexico, Albuquerque, NM

McNeil, JR
University of New Mexico, Albuquerque, NM

Bendow, B
University of New Mexico, Albuquerque, NM

Pages: 8    Published: Jan 1988

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Abstract

Heavy metal fluoride glass materials are attractive for optical applications in the near ultraviolet through infrared wavelength regions. However, many compositions are relatively soft and hygroscopic, and possess low softening temperature (250°C-300°C). We have applied ion assisted deposition (IAD) techniques to deposit MgF², SiO² and Al²O³/SiO² thin film structures on fluoride glass substrates at ambient substrate temperature (̃100°C). The coatings deposited using IAD improve the environmental durability of the fluoride glass and appear to have reasonably good optical charateristics; without application of IAD, the deposited coatings are not durable and have poor adhesion.