SEDL / STP / STP1015-EB / STP18766S

Properties of IAD Al²O³/SiO² and Ta²O⁵/SiO² Thin Film AR Structures

McNally, JJ
USAFA/DFP United States Air Force Academy, CO

Williams, FL
USAFA/DFP United States Air Force Academy, CO

Wilson, SR
USAFA/DFP United States Air Force Academy, CO

McNeil, JR
USAFA/DFP United States Air Force Academy, CO

Pages: 9    Published: Jan 1988

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Abstract

We have investigated the properties of Al²O³/SiO² and Ta²O⁵/SiO² anti-reflection coatings which have been fabricated using ion-assisted deposition (IAD) techniques. The coatings were deposited with simultaneous 0²⁺ bombardment during film growth. Preliminary laser damage results are presented. We describe the importance of oxygen-ion energy and flux in applying IAD to dielectric materials. Results illustrating increased values of film refractive index, reduction in optical scatter and improved environmental stability are reported.