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Properties of IAD Al2O3/SiO2 and Ta2O5/SiO2 Thin Film AR Structures
McNally, JJ
USAFA/DFP United States Air Force Academy, CO

Williams, FL
USAFA/DFP United States Air Force Academy, CO

Wilson, SR
USAFA/DFP United States Air Force Academy, CO

McNeil, JR
USAFA/DFP United States Air Force Academy, CO

Pages: 9    Published: Jan 1988

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Source: STP1015-EB

Abstract

We have investigated the properties of Al2O3/SiO2 and Ta2O5/SiO2 anti-reflection coatings which have been fabricated using ion-assisted deposition (IAD) techniques. The coatings were deposited with simultaneous 02+ bombardment during film growth. Preliminary laser damage results are presented. We describe the importance of oxygen-ion energy and flux in applying IAD to dielectric materials. Results illustrating increased values of film refractive index, reduction in optical scatter and improved environmental stability are reported.

Keywords:
coatings, laser-damage, oxygen-ion assisted deposition

Paper ID: STP18766S
Committee/Subcommittee: F01.19
DOI: 10.1520/STP18766S
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