STP1015: Properties of IAD Al2O3/SiO2 and Ta2O5/SiO2 Thin Film AR Structures

    McNally, JJ
    USAFA/DFP United States Air Force Academy, CO

    Williams, FL
    USAFA/DFP United States Air Force Academy, CO

    Wilson, SR
    USAFA/DFP United States Air Force Academy, CO

    McNeil, JR
    USAFA/DFP United States Air Force Academy, CO

    Pages: 9    Published: Jan 1988


    Abstract

    We have investigated the properties of Al2O3/SiO2 and Ta2O5/SiO2 anti-reflection coatings which have been fabricated using ion-assisted deposition (IAD) techniques. The coatings were deposited with simultaneous 02+ bombardment during film growth. Preliminary laser damage results are presented. We describe the importance of oxygen-ion energy and flux in applying IAD to dielectric materials. Results illustrating increased values of film refractive index, reduction in optical scatter and improved environmental stability are reported.

    Keywords:

    coatings, laser-damage, oxygen-ion assisted deposition


    Paper ID: STP18766S

    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP18766S


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