SYMPOSIA PAPER Published: 01 January 1988
STP18766S

Properties of IAD Al O /SiO and Ta O /SiO Thin Film AR Structures

Source

We have investigated the properties of Al2O3/SiO2 and Ta2O5/SiO2 anti-reflection coatings which have been fabricated using ion-assisted deposition (IAD) techniques. The coatings were deposited with simultaneous 02+ bombardment during film growth. Preliminary laser damage results are presented. We describe the importance of oxygen-ion energy and flux in applying IAD to dielectric materials. Results illustrating increased values of film refractive index, reduction in optical scatter and improved environmental stability are reported.

Author Information

McNally, JJ
Williams, FL
Wilson, SR
McNeil, JR
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Details
Developed by Committee: F01
Pages: 333–341
DOI: 10.1520/STP18766S
ISBN-EB: 978-0-8031-5031-7
ISBN-13: 978-0-8031-4479-8