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Yttrium Oxide Coatings for High Power Lasers at 351 nm
Smith, DJ
LABORATORY FOR LASER ENERGETICS and NEW YORK STATE CENTER FOR ADVANCED OPTICAL TECHNOLOGY THE INSTITUTE OF OPTICS University of Rochester, New York

Hayden, CJ
LABORATORY FOR LASER ENERGETICS and NEW YORK STATE CENTER FOR ADVANCED OPTICAL TECHNOLOGY THE INSTITUTE OF OPTICS University of Rochester, New York

Krakauer, BU
LABORATORY FOR LASER ENERGETICS and NEW YORK STATE CENTER FOR ADVANCED OPTICAL TECHNOLOGY THE INSTITUTE OF OPTICS University of Rochester, New York

Schmid, AW
LABORATORY FOR LASER ENERGETICS and NEW YORK STATE CENTER FOR ADVANCED OPTICAL TECHNOLOGY THE INSTITUTE OF OPTICS University of Rochester, New York

Guardalben, MJ
LABORATORY FOR LASER ENERGETICS and NEW YORK STATE CENTER FOR ADVANCED OPTICAL TECHNOLOGY THE INSTITUTE OF OPTICS University of Rochester, New York

Pages: 15    Published: Jan 1988

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Source: STP1015-EB

Abstract

Yttrium oxide has proven to be a useful coating material for high power UV lasers. In combination with silicon dioxide it produces an effective dual wavelength antireflection coating at 351 and 1054 nanometers which has good resistance to damage at both wavelengths. While a durable coating material, yttrium oxide may be removed safely from a lightly damaged optic and reapplied. Index inhomogeniety of the material is investigated as well as modification of the film structure with ion-assisted deposition.

Keywords:
Antireflection coatings, thin film materials, inhomogeneity, coating damage, ion-assisted deposition

Paper ID: STP18758S
Committee/Subcommittee: F01.02
DOI: 10.1520/STP18758S
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