STP1015

    Multiple Pulse Damage Studies of BK-7, KCl and SiO2 at 532 nm

    Published: Jan 1988


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    Abstract

    We report the results of damage studies at 532 nm on BK-7 glass, KCl, fused silica and two grades of crystalline quartz using a frequency doubled, Q-switched YAG laser. This work represents the initial stages of a program to investigate the mechanisms of multiple pulse laser-induced bulk damage in transparent solids. Comparison of BK-7 damage behavior with that of fused silica shows little effect due to the color center generation which occurs in BK-7 due to its small band gap. Commercially grown KCl exhibits multiple pulse catastrophic damage at fluences significantly below single pulse “threshold”, probably due to grown-in defects. Laser-induced damage behavior has been compared between two grades of crystalline quartz, with the surprising result that the nominally less perfect material is the more resistant to damage. The presence of “etch tunnels” may be involved, but considerably more study is required.

    Keywords:

    borosilicate glass, crystalline quartz, fused silica, multiple pulse damage, potassium chloride, pulse repetition frequency


    Author Information:

    Kitriotis, D
    University of Arkansas, Fayetteville, AR

    Merkle, LD
    University of Arkansas, Fayetteville, AR

    Dodson, A
    University of Arkansas, Fayetteville, AR


    Paper ID: STP18735S

    Committee/Subcommittee: F01.02

    DOI: 10.1520/STP18735S


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