STP1028

    Characterization of Calcium Fluoride Optical Surfaces

    Published: Jan 1988


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    Abstract

    A calcium fluoride polishing study has been conducted in an effort to reduce those characteristics which contribute to optical scatter effects. Using both quantitative and qualitative diagnostic techniques, the surface and subsurface characteristics produced by various polishing procedures have been either measured or rank ordered to optimize the polishing process itself. Diagnostic techniques have included bright light illumination, surface profilometry, Nomarski microscopy, total internal reflection microscopy (TIRM), and total integrated scatter (TIS). These techniques have been applied to polished surfaces and to polished surfaces that had been etched with acid. The examination of acid-etched polished surfaces has revealed the presence of subsurface polishing damage which is concealed beneath the polished surface and is undetectable by routine observation.

    Keywords:

    acid etching, calcium fluoride, polishing, subsurface damage, surface quality


    Author Information:

    Law, M
    Martin Marietta Astronautics Group, Laser Systems Technology, Albuquerque, NM

    Bender, J
    Martin Marietta Astronautics Group, Laser Systems Technology, Albuquerque, NM

    Carniglia, CK
    Martin Marietta Astronautics Group, Laser Systems Technology, Albuquerque, NM


    Paper ID: STP18590S

    Committee/Subcommittee: E13.06

    DOI: 10.1520/STP18590S


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