Published: Jan 1988
| ||Format||Pages||Price|| |
|PDF ()||1||$25||  ADD TO CART|
|Complete Source PDF (17M)||1||$88||  ADD TO CART|
Many papers have been written on the design of laser-damage-resistant high reflectors. Usually, reduction in the peak electric-field intensity in the outermost layers of a multilayer stack is studied.
In this work, the effect of random and systematic errors in the quarter-wave stack below the enhanced layers is investigated. Also, optical monitoring errors in the optimized layers and their relation to the standing-wave electric field through the multilayer stack are discussed.
electric field distribution, film thickness error, laser damage, multilayer films
Los Alamos National Laboratory, Los Alamos, New Mexico