Properties of IAD Single- and Multi-Layer Oxide Coatings

    Published: Jan 1988

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    Properties of oxide thin films deposited using oxygen-ion assisted deposition (IAD) were studied. Previously, we reported on the properties of Al2O3/SiO2 and Ta2O5/SiO2 anti-reflection coatings fabricated using IAD. In this report we present results illustrating the effects of ion bombardment during the deposition of single-layer films of Ta2O5, Al2O3 and SiO2. The optical constants and stress measurements of these films are reported. Oxygen ion bombardment during deposition produced Ta2O5 and Al2O3 coatings with larger values of refractive index (n). No increase in n was observed for IAD SiO2. Laser damage results at 351 nm for Al2O3/SiO2 and Ta2O5/SiO2 AR coatings are presented. It appears that the IAD coatings did not have higher damage threshold values than the coatings deposited with no ion bombardment. A number of coatings were exposed to fluorine gas tests. The results from these tests are reported.


    F, 2, resistance, laser-damage, oxygen-ion assisted deposition

    Author Information:

    McNally, JJ
    United States Air Force Academy, CO

    Williams, FL
    United States Air Force Academy, CO

    Wilson, SR
    United States Air Force Academy, CO

    McNeil, JR
    United States Air Force Academy, CO

    Committee/Subcommittee: F01.10

    DOI: 10.1520/STP18581S

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