SEDL / STP / STP1028-EB / STP18578S

Chemical Vapor Deposition of TiO² Thin Films at Room Temperature

Wilder, J
Lawrence Livermore National Laboratory University of California, Livermore, California

Thomas, I
Lawrence Livermore National Laboratory University of California, Livermore, California

Pages: 5    Published: Jan 1988

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Abstract

Titania coatings were prepared using a chemical vapor deposition (CVD) apparatus at room temperature. Coating were deposited by the reaction of gaseous TiCl⁴ and H²O at the substrate surface. High refractive indices were obtained with damage thresholds to 12.9 J/cm², at 1.06 μm, 1 ns.