STP1028: 1064 nm and 350 nm Laser Damage Thresholds of High Index Oxide Films Deposited from Organic Solutions and Sols

    Thomas, I
    Lawrence Livermore National Laboratory, Livermore, California

    Wilder, J
    Lawrence Livermore National Laboratory, Livermore, California

    Gonzales, R
    Lawrence Livermore National Laboratory, Livermore, California

    George, D
    Lawrence Livermore National Laboratory, Livermore, California

    Pages: 4    Published: Jan 1988


    Abstract

    High index optical coatings of the oxides TiO2, Ta2O5, ZrO2 and HfO2 have been prepared from solutions of metal organic precursors and from colloidal oxide suspensions. Room temperature processing gives porous coatings of comparatively low refractive index (1.8-1.9). Heat treatments can, in some cases, increase the index. Laser damage threshold levels at 1064 nm with a single 1 ns pulse are in the range 6–10 J/cm2, which is comparable with coatings of the same materials produced by electron beam evaporation. Lower figures are obtained at 350 nm with a 25 ns pulse under multishot (25 Hz) conditions.

    Keywords:

    Laser damage, TiO, 2, Ta, 2, O, 5, ZrO, 2, HfO, 2, HR coatings, sol gel


    Paper ID: STP18576S

    Committee/Subcommittee: F01.19

    DOI: 10.1520/STP18576S


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