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Thermal Conductivity of Dielectric Films and Correlation to Damage Threshold at 1064nm Pages: 7 Published: Jan 1988
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View License Agreement An infrared line scanning technique has been used to measure thermal conductivities of TiO2, Ta2O5, ZrO2, HfO2, A12O3 and SiO2 layers. Damage thresholds are determined using a two stage Nd:Yag laser with pulse length of 14ns and spot size of 300μ. A correlation between thermal conductivity, absorption coefficient, melting point and damage threshold is established. To explain the relation, theoretical models based on absorption and inclusion breakdown are analysed. | ||