SEDL / STP / STP1028-EB / STP18532S

Development of Silicophosphate Glass HAP-3

Izumitani, T
HOYA CORPORATION, Tokyo,

Matsukawa, M
HOYA CORPORATION, Tokyo,

Hata, C
HOYA CORPORATION, Tokyo,

Tanaka, K
HOYA CORPORATION, Tokyo,

Toratani, H
HOYA CORPORATION, Tokyo,

Pages: 6    Published: Jan 1988

Download this paper for $25 PDF (148K)          View License Agreement
Abstract

Silicophosphate glass HAP with high thermal shock resistance was developed. As the thermal conductivity of glass can not be increased, thermal expansion coefficient was tried to make smaller and mechanical strength to make higher. P²O⁵-SiO²-Li²O system was investigated. In P²O⁵-SiO²-Li²O system, thermal expansion coefficient decreases and mechanical strength increases with SiO² content, but chemical durability becomes worse. The weak chemical durability was improved by introducing Al²O³ in the system. HAP-3 selected from P²O⁵-SiO²-Li²O has higher thermal shock resistance, as 2.7 times as LHG-8, as 1.6 times high as LHG-5, low content of water and low concentration quenching.