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Tensile Testing of Thin Films Using Electrostatic Force Grip
Tsuchiya T, Sakata J


Pages: 15    Published: Jan 2001


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Source: STP1413-EB


Abstract
Thin film tensile testers using an electrostatic force grip system were developed to enable increased reliability in MEMS devices. This grip system uses electrostatic force to chuck a thin film specimen. The chucking force is easily controlled and the damage to the specimen during testing can be minimized. With these testers, silicon, silicon-dioxide, and silicon-nitride thin films fabricated with surface micromachining were tensile-tested in a vacuum and in air. The specimens were 2 to 10 im wide, 30 to 300 m long, and 0.7 to 2.0 m thick. We compare the strength of these films and discuss the fracture properties of the films and the effect of the environment.


Keywords:
tensile test, tensile strength, fracture toughness, polysilicon, silicon dioxide, silicon nitride, electrostatic force grip

Paper ID: STP10991S
Committee/Subcommittee: E08.01
DOI: 10.1520/STP10991S
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