STP1413: Influence of the Film Thickness on Texture, Residual Stresses and Cracking Behavior of PVD Tungsten Coatings Deposited on a Ductile Substrate

    Ganne, T
    Centre Technique d'Arcueil, Arcueil,

    Laboratoire de Mécanique des Solides, CNRS, Ecole Polytechnique, Palaiseau,

    Farges, G
    Centre Technique d'Arcueil, Arcueil,

    Crépin, J
    Laboratoire de Mécanique des Solides, CNRS, Ecole Polytechnique, Palaiseau,

    Pradeilles-Duval, R-M
    Laboratoire de Mécanique des Solides, CNRS, Ecole Polytechnique, Palaiseau,

    Zaoui, A
    Laboratoire de Mécanique des Solides, CNRS, Ecole Polytechnique, Palaiseau,

    Pages: 13    Published: Jan 2001


    Abstract

    Tungsten coatings are deposited on a steel substrate by magnetron sputtering. for coatings deposited under identical processing conditions, a (111) texture develops with the increase of the coating thickness and the decrease of the residual stress. No gradient stress has been observed in the diffracted volume and the residual stress state is isotropic and plane. Tensile and four-point bending tests are performed in a SEM chamber in order to study the cracking kinetics. Taking account of the residual stresses, an intrinsic cracking stress can be determined. Cracking kinetics are found to depend on the coating thickness and the substrate yield stress. No debonding was observed at the interface despite the large plastic deformation of the substrate at the crack tips. This corresponding strain localization has a strong influence on the crack density and the cracking kinetics.

    Keywords:

    magnetron sputtering, residual stresses, crystallographic texture, cracking behavior, tungsten coating


    Paper ID: STP10984S

    Committee/Subcommittee: E08.05

    DOI: 10.1520/STP10984S


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