Layer Growth Kinetics during Post-Discharge Nitriding

    Volume 9, Issue 2 (February 2012)

    ISSN: 1546-962X

    CODEN: JAIOAD

    Published Online: 14 October 2011

    Page Count: 11


    Oseguera, Joaquin
    Instituto Tecnológico y de Estudios Superiores de Monterrey,

    Castillo, Francisco
    Instituto Tecnológico y de Estudios Superiores de Monterrey,

    (Received 11 November 2010; accepted 20 September 2011)

    Abstract

    A mathematical simulation of the evolution of nitrogen concentration profiles in iron samples is presented. The nitrogen concentration profiles are produced by a nitrogen microwave post-discharge. This mathematical model takes into account the nitrogen concentration evolution from the very beginning of the process and describes the formation and growth of compact nitride layers. This model also proposes a description of how the solubility limits in each growing phase are attained during the layer formation. An approximate analytical solution of Goodman’s type for the model is sought. This leads to a system of differential algebraic equations (DAE). Then, the DAE is finally numerically solved. The steady state of the process is also studied within the model. In this case, analytical representations of the nitrogen concentration profiles and the diffusion coefficients are found


    Paper ID: JAI103568

    DOI: 10.1520/JAI103568

    ASTM International is a member of CrossRef.

    Author
    Title Layer Growth Kinetics during Post-Discharge Nitriding
    Symposium , 0000-00-00
    Committee G02