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ASTM WK19049

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Work Item: ASTM WK19049 - New Test Method for Consistence and Reproducibility of Sputter Rate Measurements


Developed by Subcommittee: E42.08 | Committee E42 Home | Contact Staff Manager



1. Scope

Develop standard to assess the consistency and reproducibility of sputter rate measurements used for depth profile information during surface analysis. Would apply to X-ray photoelectron spectroscopy, Auger electron spectroscopy, Secondary ion mass spectrometry and other surface sensitive analysis methods. Depth of thin layers was identified as a major information need in surface analysis by surveys done for E42 and ISO TC201. In developing this information, the consistency and reproducibility of ion sputter rates was identified as a major limitation. Based on these needs an ISL has been identified to determine the range of variability for current instruments. This would lead to development of a standard to assess the status and variability of specific instruments.


Keywords

Sputtering; depth profiles; film thickness;

The title and scope are in draft form and are under development within this ASTM Committee.

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Work Item Status:
Date Initiated:03-05-2008
Technical Contact: Mark Engelhard

Status: Draft Under Development

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