ASTM F518-77(1991)E01Withdrawn Standard: ASTM F518-77(1991)E01 Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)WITHDRAWN, NO REPLACEMENT There is no PDF download available at this time, however you may purchase a copy of this document from Global Engineering Documents (Email: globalcustomerservice@ihs.com; Phone: 800-854-7179 or 303-397-7956).
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