ASTM F154 - 02 Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)

1. Scope

This standard was transferred to SEMI (www.semi.org) May 2003

1.1 The purpose of this guide is to list, illustrate, and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers. Recommended practices for delineation and observation of these artifacts are referenced. The artifacts described in this guide are intended to parallel and support the content of the SEMI M18. These artifacts and common synonyms are arranged alphabetically in Tables 1 and 2 and illustrated in Figs. 1-68 .

Index Terms

contaminant; defects; dislocation; epitaxial; fracture; preferential etch; scratch; shallow pit; silicon; slip; stacking fault;

DOI: 10.1520/F0154-02

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ASTM F154-02

Withdrawn Standard: ASTM F154-02 Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)