All Standards Related to F1238

Standards

Standards Related to F1238 - Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications /

F1761-00(2011)	Standard Test Method for Pass Through Flux of Circular Magnetic Sputtering Targets
Also Available in these Collections: Annual Book of ASTM Standards Online: 10.04 Developed By: Committee F01 on Electronics

F1709-97(2008)	Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
Also Available in these Collections: Annual Book of ASTM Standards Online: 10.04 Developed By: Committee F01 on Electronics

F1367-98(2011)	Standard Specification for Chromium Sputtering Targets for Thin Film Applications
Also Available in these Collections: Annual Book of ASTM Standards Online: 10.04 Developed By: Committee F01 on Electronics

F2113-01(2011)	Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
Also Available in these Collections: Annual Book of ASTM Standards Online: 10.04 Developed By: Committee F01 on Electronics

F1894-98(2011)	Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness
Also Available in these Collections: Annual Book of ASTM Standards Online: 10.04 Developed By: Committee F01 on Electronics

F1512-94(2011)	Standard Practice for Ultrasonic C-Scan Bond Evaluation of Sputtering Target-Backing Plate Assemblies
Also Available in these Collections: Annual Book of ASTM Standards Online: 10.04 Developed By: Committee F01 on Electronics

F677-13	Standard Test Method for Fluid and Grease Resistance of Thermoset Encapsulating Compounds Used in Electronic and Microelectronic Applications
Also Available in these Collections: Annual Book of ASTM Standards Online: 10.02 Developed By: Committee D09 on Electrical and Electronic Insulating Materials