1.1 This test method closely estimates the thickness of individual layers of a multilayer nickel electrodeposit and the potential differences between the individual layers while being anodically stripped at constant current density.
1.2 This test method does not cover deposit systems other than multilayer electroplated nickel deposits.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
2. Referenced Documents (purchase separately) The documents listed below are referenced within the subject standard but are not provided as part of the standard.
B456 Specification for Electrodeposited Coatings of Copper Plus Nickel Plus Chromium and Nickel Plus Chromium
B504 Test Method for Measurement of Thickness of Metallic Coatings by the Coulometric Method
D1193 Specification for Reagent Water
potential; STEP; thickness; Reference electrode; Step test; Stripping; Thickness--electrodeposited coatings; Agitating tube; Anodic coatings; Buffering action; Cathode coatings; Chromium electroplating; Corrosion--electrodeposited coatings; Coulometry--metallic materials; Current measurement; Density--metallic coatings; Deplating cell; Electrodeposited Ni coatings; Electrolytic determination; Metallic coatings; Multilayer nickel deposit; Nickel coatings; Purified water; Reagent water;
ICS Number Code 25.220.40 (Metallic coatings)
ASTM International is a member of CrossRef.
Citing ASTM Standards
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