This volume addresses the problems in semiconductor technology that arise from rapid increase in device complexity and performance, the emergence of integrated systems-on-a-chip, automated factories, and silicon foundries. The book's theme is that the realization of acceptable yields and reliability will require greater manufacturing discipline from starting materials to finished devices. 51 papers cover crystal growth and epitaxial depositing, control of contaminants, material characterization defects, interconnection technology, ion implantation, and special processing techniques.